En-Jou Hsiao

Title: En-Jou Hsiao: Innovator in COlaser-Transparent Materials

Introduction

En-Jou Hsiao is a notable inventor based in Douliu, Taiwan. He has made significant contributions to the field of materials science, particularly in the development of COlaser-transparent materials. With a total of 2 patents to his name, Hsiao's work focuses on innovative methods for creating and utilizing these materials.

Latest Patents

Hsiao's latest patents revolve around a COlaser-transparent material that features a mark on its surface. The method for creating this material involves several steps. First, a first substrate with a top and bottom surface is provided. Next, a second substrate with a top surface is prepared. The bottom surface of the first substrate is placed on the top surface of the second substrate. A COlaser beam is then irradiated onto the top surface of the second substrate, passing through both surfaces of the first substrate. This process results in a mark being formed on the bottom surface of the first substrate. The material of the mark can either be an oxide of the second substrate or the same material as the second substrate. This innovative approach allows for the use of a cost-effective COlaser to create the mark, which can be easily erased with a suitable chemical, facilitating the recycling of the first substrate.

Career Highlights

En-Jou Hsiao is affiliated with National Cheng Kung University, where he continues to advance his research and development efforts. His work has garnered attention for its practical applications and potential impact on the industry.

Collaborations

Hsiao collaborates with esteemed colleagues such as Chen-Kuei Chung and Meng-Yu Wu, contributing to a dynamic research environment that fosters innovation.

Conclusion

En-Jou Hsiao's contributions to the field of COlaser-transparent materials exemplify the spirit of innovation. His patents reflect a commitment to advancing technology while promoting sustainability through recycling methods.