Company Filing History:
Years Active: 1983-1991
Title: En-Den D Liu: Innovator in Photoresist Technology
Introduction
En-Den D Liu is a prominent inventor based in Mountain View, CA. He has made significant contributions to the field of photoresist technology, holding 2 patents that showcase his innovative approaches to solving complex problems in the industry.
Latest Patents
His latest patents include a method for compensating for the E-beam proximity effect. This method involves a post-exposure, pre-development baking of the photoresist layer, which causes a migration of small, photo-active compound (PAC) molecules. This migration increases the size of peripheral exposed areas to compensate for exposure size variations caused by the proximity effect. Another notable patent is the multilayer photoresist process utilizing an absorbent dye. This improved photoetch technique involves depositing a thin top layer of resist and a thick planarizing layer on a substrate. The thin layer is then exposed and developed to produce a patterned resist layer, with the improvement being the dissolution of a suitable dye in a layer between the thin top layer and the substrate.
Career Highlights
En-Den D Liu is currently associated with Hewlett-Packard Company, where he continues to push the boundaries of innovation in his field. His work has been instrumental in advancing photoresist technologies that are critical for various applications in electronics and materials science.
Collaborations
He has collaborated with notable colleagues such as Michael M O'Toole and Mark S Chang, contributing to a dynamic environment of innovation and research.
Conclusion
En-Den D Liu's contributions to photoresist technology through his patents and collaborations highlight his role as a key innovator in the field. His work continues to influence advancements in technology and materials science.