Budapest, Hungary

Emöke Lörincz

This inventor holds 1 USPTO granted patent. Top assignee: Riso National Laboratory. Active years: 2008.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Emöke Lörincz. Retrieved from https://idiyas.com/inventor/emöke-lörincz

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 9(Granted Patents)


Company Filing History:


Years Active: 2008

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1 patent (USPTO):Explore Patents

Title: Emöke Lörincz: Innovator in Holographic Recording Technology

Introduction: Emöke Lörincz is a distinguished inventor based in Budapest, Hungary. He has made significant contributions to the field of holographic recording technology, particularly through his innovative methods for data storage.

Latest Patents: Lörincz holds a patent for a "System and method for recording of information on a holographic recording medium, preferably an optical card." This invention pertains to a method for recording and reading data using a holographic write/read apparatus on a holographic recording medium with a thin recording layer. The technology utilizes reflected transmission and polarization holography, employing different wavelengths for writing and reading data, while also addressing distortion issues during the readout process.

Career Highlights: Emöke Lörincz is currently associated with the Riso National Laboratory, where he continues to advance research in holographic technologies. His work has garnered attention for its potential applications in data storage and retrieval.

Collaborations: Throughout his career, Lörincz has collaborated with notable colleagues, including P S Ramanujam and Sören Hvilsted. These partnerships have contributed to the development and refinement of his innovative methods.

Conclusion: Emöke Lörincz stands out as a key figure in the realm of holographic recording technology. His inventive spirit and collaborative efforts have

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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