This inventor holds 1 USPTO granted patent. Top assignee: Pagendarm Gmbh. Active years: 1993.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1993
Title: Emin Onur - Innovator in Drying Technology
Introduction
Emin Onur is a notable inventor based in Hamburg, Germany. He has made significant contributions to the field of drying technology, particularly in the method and apparatus for drying coated substrates. His innovative approach has the potential to enhance the quality of coatings in various applications.
Latest Patents
Emin Onur holds a patent for a "Method of and apparatus for drying coated substrates." This invention involves a running substrate coated with a solvent-containing material, which is conveyed through multiple sections of a drying unit. The drying process utilizes a stream of inert gas that flows counter to the substrate's movement. The temperature of the inert gas is reduced as it moves through the sections, and the solvent quantity in the inert gas is maintained slightly below saturation during the initial drying stage. This technique significantly improves the surface finish of the coating.
Career Highlights
Emin Onur is currently associated with Pagendarm GmbH, where he applies his expertise in drying technology. His work focuses on developing advanced methods that enhance the efficiency and effectiveness of coating processes. With a patent portfolio that includes one significant patent, he continues to push the boundaries of innovation in his field.
Collaborations
Emin collaborates with Georg Johnke, a coworker at Pagendarm GmbH. Their partnership fosters a creative environment that encourages the development of new ideas and technologies.
Conclusion
Emin Onur is a distinguished inventor whose work in drying technology has the potential to revolutionize the coating industry. His innovative methods and dedication to improving surface finishes demonstrate his commitment to advancing technology.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile