Pullach, Germany

Emilie Duval

This inventor holds 1 USPTO granted patent. Top assignee: Linde Gmbh. Active years: 2026.


% Patents Active = 100.0

Average Co-Inventor Count = 7.0

ph-index = 1


Company Filing History:


Years Active: 2026

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Emilie Duval: Innovator in Gas Treatment Processes

Introduction

Emilie Duval is a notable inventor based in Pullach, Germany. He has made significant contributions to the field of gas treatment processes. His innovative approach has led to the development of a unique gas treatment process that enhances efficiency and effectiveness.

Latest Patents

Emilie Duval holds 1 patent for his invention titled "Gas treatment process and process arrangement." This invention proposes a gas treatment process that utilizes a process arrangement comprising three process units. The process involves operating a different one of the three process units in a heating mode during a heating phase. The heating mode includes heating a first gas stream to a first temperature level using a first heat exchanger, introducing the first gas stream at the first temperature level to the process unit operated in the heating mode, withdrawing a second gas stream from the process unit, and subsequently cooling the second gas stream to a second temperature level using a second heat exchanger.

Career Highlights

Emilie Duval is associated with Linde GmbH, a leading company in the industrial gases sector. His work at Linde GmbH has allowed him to focus on innovative solutions in gas treatment. His contributions have been instrumental in advancing the technology used in this field.

Collaborations

Emilie has collaborated with notable coworkers such as Florian Deichsel and Verena Kramer. Their teamwork has fostered an environment of innovation and creativity, leading to advancements in gas treatment technologies.

Conclusion

Emilie Duval's work in gas treatment processes exemplifies the spirit of innovation. His patent and contributions to Linde GmbH highlight his commitment to advancing technology in this critical field.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to [email protected]
Loading…