Emiko Hara

Title: Emiko Hara: Innovator in Plasma Processing Technology

Introduction

Emiko Hara is a prominent inventor based in Nirasaki, Japan. She has made significant contributions to the field of plasma processing technology. Her innovative work has led to the development of a unique plasma processing device that enhances substrate processing efficiency.

Latest Patents

Emiko holds 1 patent for her invention titled "Plasma processing device with shower plate having protrusion for suppressing film formation in gas holes of shower plate." This device processes a substrate by generating plasma using a surface wave formed on a shower plate by a supplied microwave. The invention includes a plasma generating antenna equipped with the shower plate for supplying first and second gases into a processing vessel. Additionally, it features a drooping member that protrudes downward from the lower end surface of the shower plate, designed to optimize gas flow and minimize film formation.

Career Highlights

Emiko Hara is associated with Tokyo Electron Limited, a leading company in the semiconductor and electronics manufacturing industry. Her work at the company has been instrumental in advancing plasma processing technologies. She has demonstrated a commitment to innovation and excellence throughout her career.

Collaborations

Emiko has collaborated with notable colleagues, including Taro Ikeda and Shigeru Kasai. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and technological advancements.

Conclusion

Emiko Hara's contributions to plasma processing technology exemplify her dedication to innovation. Her patent and work at Tokyo Electron Limited highlight her role as a leading inventor in her field. Emiko continues to inspire future generations of inventors and engineers.