Tokyo, Japan

Emi Sugimoto

This inventor holds 1 USPTO granted patent. Top assignee: Sony Corporation. Active years: 1997.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Emi Sugimoto. Retrieved from https://idiyas.com/inventor/emi-sugimoto-ohkzfwnp

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 11(Granted Patents)


Company Filing History:


Years Active: 1997

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1 patent (USPTO):Explore Patents

Title: Emi Sugimoto - Innovator in Spin Coating Technology

Introduction

Emi Sugimoto is a prominent inventor based in Tokyo, Japan. She has made significant contributions to the field of spin coating technology, particularly through her innovative designs that enhance the quality of substrates.

Latest Patents

Emi Sugimoto holds a patent for a spin coating device that allows for the formation of a uniform thin film on substrates. This device includes a turntable for holding and rotating the substrate, an application liquid supply system, and splash preventing mechanisms to ensure the quality of the substrate is maintained. The patent highlights her ability to integrate various components to improve the efficiency and effectiveness of the spin coating process. She has 1 patent to her name.

Career Highlights

Emi Sugimoto is currently employed at Sony Corporation, where she continues to innovate and develop new technologies. Her work has been instrumental in advancing the capabilities of spin coating devices, making them more reliable and efficient for various applications.

Collaborations

Emi has collaborated with notable colleagues such as Akira Yoshio and Yoshinori Ito, contributing to a dynamic work environment that fosters creativity and innovation.

Conclusion

Emi Sugimoto's contributions to spin coating technology exemplify her dedication to innovation and excellence in her field. Her work not only enhances the quality of substrates but also sets a benchmark for future developments in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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