Tokyo, Japan

Emi Hirose

This inventor holds 2 USPTO granted patents and 2 EPO patents. Top assignee: Dai Nippon Printing Co., Ltd.. Active years: 2020.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Emi Hirose. Retrieved from https://idiyas.com/inventor/emi-hirose

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

 

Average Co-Inventor Count = 2.4

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2020

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2 patents (USPTO):Explore Patents

Title: Emi Hirose: Innovator in Decorative Sheet Technology

Introduction

Emi Hirose is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of decorative sheet technology, holding 2 patents that showcase his innovative approach to design and functionality.

Latest Patents

Hirose's latest patents include a decorative sheet that features an asperity profile, which creates a highly textured impression, such as a contoured or three-dimensional effect. This decorative sheet maintains exceptional surface flatness, making it ideal for various applications. Another patent focuses on a decorative sheet with a bulging section that effectively inhibits cracking during molding. This invention also enhances scratch resistance and the quality of design in the convex and concave features of the bulging section.

Career Highlights

Emi Hirose is associated with Dai Nippon Printing Co., Ltd., where he continues to develop innovative solutions in decorative materials. His work has garnered attention for its practical applications and aesthetic appeal.

Collaborations

Hirose collaborates with talented individuals such as Sakie Kataoka and Masatoshi Sutou, contributing to a dynamic team that pushes the boundaries of decorative technology.

Conclusion

Emi Hirose's contributions to decorative sheet technology reflect his commitment to innovation and design excellence. His patents not only enhance the aesthetic qualities of materials but also improve their functionality, marking him as a significant figure in his field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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