Company Filing History:
Years Active: 2016
Title: Emeline Souchier: Innovator in Thin Film Technology
Introduction
Emeline Souchier is a notable inventor based in Donzere, France. She has made significant contributions to the field of materials science, particularly in the development of methods for preparing thin films of thiospinels. Her innovative approach has led to advancements in the application of these materials in various technological domains.
Latest Patents
Emeline Souchier holds a patent for a method of preparing a thin film of at least one compound of formula AMX. In this formula, A represents Ga or Ge, M signifies V, Nb, Ta, or Mo, and X denotes S or Se. The patented method involves two key steps: first, forming a thin film through magnetron spraying of a target that includes at least one compound of the specified formula in an inert gas atmosphere. The second step involves annealing the thin film through heat treatment, with the process being conducted in the presence of sulfur or selenium, depending on the compound used.
Career Highlights
Emeline Souchier is affiliated with the Centre National de la Recherche Scientifique, a prestigious research institution in France. Her work has been instrumental in advancing the understanding and application of thiospinel compounds in thin film technology. With her innovative methods, she has contributed to the development of new materials that have potential applications in electronics and optoelectronics.
Collaborations
Emeline has collaborated with esteemed colleagues, including Marie-Paule Besland and Laurent Carlo. These collaborations have fostered a productive research environment, leading to significant advancements in their respective fields.
Conclusion
Emeline Souchier's contributions to the field of thin film technology exemplify the impact of innovative research on material science. Her patented methods and collaborative efforts continue to pave the way for future advancements in this critical area of study.