Amherst, NH, United States of America

Elsa Kam-Lum

USPTO Granted Patents = 3 

Average Co-Inventor Count = 3.8

ph-index = 3

Forward Citations = 70(Granted Patents)


Company Filing History:


Years Active: 1980-2013

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3 patents (USPTO):Explore Patents

Title: Innovations of Elsa Kam-Lum: Pioneering Magnetic Field Sensor Technology

Introduction

Elsa Kam-Lum, an inventive force based in Amherst, NH, has made significant contributions to the field of magnetic sensor technology. With a total of three patents to her name, she has showcased a remarkable ability to innovate within the technological landscape. Her latest work focuses on advancing the design and fabrication methods of magnetic field sensors.

Latest Patents

Elsa's recent patents revolve around magnetic field sensors and methods for their fabrication. These innovations include molded structures that encapsulate a magnetic field sensing element along with a die attach pad of a lead frame. Additionally, these patents also address the encapsulation or formation of a magnet or a flux concentrator, underlining her attention to both design and functionality in sensor technology.

Career Highlights

Throughout her career, Elsa has made impactful strides in the technology sector. She has worked with reputable companies such as Allegro Microsystems, LLC and Sprague Electric Company, leveraging her expertise in developing cutting-edge sensor technologies. Her role in these organizations has been instrumental in driving innovation forward.

Collaborations

In her professional journey, Elsa has collaborated with industry peers, including notable colleagues like Virgil Ararao and Nirmal Sharma. These partnerships have fostered an environment of creativity and innovation, leading to advancements in the technologies they explore.

Conclusion

Elsa Kam-Lum stands out as a pioneering inventor specializing in magnetic field sensor technology. With her notable patents and collaborative spirit, she continues to inspire innovation and excellence within her field. Her work not only enhances existing technologies but also paves the way for future advancements in sensor technology.

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