Midland, MI, United States of America

Ellen M Dubensky


Average Co-Inventor Count = 3.4

ph-index = 7

Forward Citations = 191(Granted Patents)


Location History:

  • Traverse City, MI (US) (1990 - 1993)
  • Midland, MI (US) (1996 - 2003)

Company Filing History:


Years Active: 1990-2003

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10 patents (USPTO):Explore Patents

Title: Trailblazing Inventor Ellen M Dubensky: Pioneering Innovation in Midland, MI

Introduction:

Ellen M Dubensky is a visionary inventor whose relentless pursuit of innovation and passion for solving complex problems have made her a trailblazer in the world of inventors. Her groundbreaking work continues to inspire future generations to reach new heights of excellence.

Latest Patents:

Ellen M Dubensky holds an impressive total of 10 patents. Two of her latest patents include a "Method to form dense complex shaped articles" and "Thermoformable ethylene/styrene interpolymer-based polymer blend film for three-dimensional transfer finish foil." The former focuses on creating consolidated shaped articles with a density of at least about 95 percent of theoretical density, while the latter explores the use of thermoformable films for heat transfer foils.

Career Highlights:

Ellen M Dubensky has made significant contributions during her tenure at The Dow Chemical Company and Dow Global Technologies LLC. Her innovative ideas and problem-solving skills have led to the development of cutting-edge technologies that have reshaped industries and improved processes.

Collaborations:

Throughout her career, Ellen M Dubensky has collaborated with esteemed colleagues such as Edward E Timm and Robert Thomas Nilsson. Together, they have worked on various projects that have pushed the boundaries of innovation and set new standards in their respective fields.

Conclusion:

In conclusion, Ellen M Dubensky's unwavering dedication to innovation and her ability to think outside the box have established her as a true trailblazer in the world of inventors. Her work serves as a testament to the power of creativity and perseverance in driving progress and shaping the future of technology.

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