Company Filing History:
Years Active: 2009
Title: The Innovative Contributions of Ellen Claus
Introduction
Ellen Claus is a prominent inventor based in Dresden, Germany. She has made significant contributions to the field of metallization techniques, particularly in enhancing the adhesion of metallization layers. Her innovative approach has implications for various applications in the electronics industry.
Latest Patents
Ellen Claus holds a patent for a technique aimed at increasing the adhesion of metallization layers by providing dummy vias. This method reduces the risk of metal delamination in subsequent processes. By incorporating dummy vias beneath electrically non-functional metal regions, the mechanical strength of the metallization layers is enhanced. Additionally, these dummy metal regions serve as anchors for overlying non-functional metal regions, further improving stability and performance.
Career Highlights
Ellen Claus is associated with Advanced Micro Devices Corporation, where she applies her expertise in metallization techniques. Her work has been instrumental in advancing the reliability and performance of electronic components. With a patent portfolio that includes 1 patent, she continues to push the boundaries of innovation in her field.
Collaborations
Ellen has collaborated with notable colleagues such as Ralf Richter and Matthias Schaller, contributing to a dynamic and innovative work environment. Their collective efforts have fostered advancements in technology and research.
Conclusion
Ellen Claus exemplifies the spirit of innovation in the field of electronics through her patented techniques and collaborative efforts. Her work not only enhances the mechanical stability of metallization layers but also contributes to the overall performance of electronic devices.