Mortsel, Belgium

Elke Dom

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Agfa Offset Bv. Active years: 2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Elke Dom. Retrieved from https://idiyas.com/inventor/elke-dom-se1838bs

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2023

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1 patent (USPTO):Explore Patents

Title: Elke Dom - Innovator in Lithographic Printing Technology

Introduction

Elke Dom is a prominent inventor based in Mortsel, Belgium. She has made significant contributions to the field of lithographic printing technology. With a focus on innovation, she has developed a unique patent that enhances the efficiency and quality of printing processes.

Latest Patents

Dom holds a patent for a lithographic printing plate precursor. This invention includes a photopolymerisable coating and an overcoat layer provided on top of said layer. The overcoat layer is characterized by a compound comprising at least one moiety having a specific structure according to Formula (I). This advancement in printing technology is crucial for improving the performance of lithographic printing plates.

Career Highlights

Elke Dom is associated with Agfa Offset Bv, a company known for its expertise in printing solutions. Her work at Agfa Offset Bv has allowed her to focus on developing innovative products that meet the evolving needs of the printing industry.

Collaborations

Dom has collaborated with notable colleagues, including Nicolas Vriamont and Thomas Billiet. These partnerships have fostered a creative environment that encourages the exchange of ideas and expertise in the field of printing technology.

Conclusion

Elke Dom is a trailblazer in lithographic printing technology, with her innovative patent showcasing her commitment to advancing the industry. Her contributions continue to influence the future of printing solutions.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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