Lakewood, CO, United States of America

Elisabeth Lynne Mcclure

This inventor holds 1 USPTO granted patent. Top assignees: Alliance for Sustainable Energy, LLC, Rochester Institute of Technology. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Elisabeth Lynne Mcclure. Retrieved from https://idiyas.com/inventor/elisabeth-lynne-mcclure

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Elisabeth Lynne McClure: Innovator in Hydride Vapor Phase Epitaxy

Introduction

Elisabeth Lynne McClure is a notable inventor based in Lakewood, Colorado. She has made significant contributions to the field of hydride vapor phase epitaxy, particularly through her innovative patent. Her work focuses on enhancing growth rates using nitrogen-enabled methods, showcasing her expertise in the field.

Latest Patents

Elisabeth holds a patent titled "Nitrogen-enabled high growth rates in hydride vapor phase epitaxy." This patent discloses methods and devices that utilize a low-thermal conductivity inert gas to shield reactant gases, enabling a cold wall operation within a hot wall system. This innovation has the potential to improve efficiency in various applications.

Career Highlights

Throughout her career, Elisabeth has worked with reputable organizations, including the Alliance for Sustainable Energy, LLC and the Rochester Institute of Technology. Her experience in these institutions has allowed her to develop and refine her skills in research and innovation.

Collaborations

Elisabeth has collaborated with talented individuals such as Kevin Louis Schulte and Aaron Joseph Ptak. These partnerships have contributed to her success and the advancement of her projects.

Conclusion

Elisabeth Lynne McClure is a pioneering inventor whose work in hydride vapor phase epitaxy demonstrates her commitment to innovation. Her contributions to the field are noteworthy and continue to inspire future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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