Breitenwang, Austria

Elisabeth Eidenberger


 

Average Co-Inventor Count = 7.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2021

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1 patent (USPTO):Explore Patents

Title: Elisabeth Eidenberger: Innovator in Thin-Film Metallization

Introduction

Elisabeth Eidenberger is a notable inventor based in Breitenwang, Austria. She has made significant contributions to the field of thin-film technology, particularly in metallization processes. Her innovative work has led to the development of a patented process that enhances the production of thin-film components.

Latest Patents

Elisabeth holds a patent for "Metallization for a thin-film component, process for the production thereof and sputtering target." This patent describes a metallization that includes at least one layer composed of an Mo-based alloy containing aluminum (Al) and titanium (Ti), along with usual impurities. The process for producing this metallization involves providing at least one sputtering target, depositing the alloy layer, and structuring the metallization through photolithographic processes and subsequent etching steps. The sputtering target itself is made from an Mo-based alloy that includes Al and Ti.

Career Highlights

Elisabeth Eidenberger is associated with Plansee SE, a company known for its expertise in high-performance materials. Her work at Plansee SE has allowed her to focus on advancing metallization techniques that are crucial for various applications in electronics and materials science.

Collaborations

Elisabeth has collaborated with notable colleagues, including Harald Koestenbauer and Judith Koestenbauer. These collaborations have contributed to the development and refinement of her innovative processes.

Conclusion

Elisabeth Eidenberger's contributions to thin-film metallization represent a significant advancement in the field. Her patented processes and collaboration with esteemed colleagues highlight her role as a leading innovator in this technology.

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