Rochester, MN, United States of America

Eldon Gale Nelson

USPTO Granted Patents = 1 

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2012

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1 patent (USPTO):Explore Patents

Title: Eldon Gale Nelson: Innovator in Integrated Circuit Design

Introduction

Eldon Gale Nelson is a notable inventor based in Rochester, MN (US). He has made significant contributions to the field of integrated circuit design, particularly through his innovative patent related to spare latch placement quality determination.

Latest Patents

Eldon holds a patent titled "Implementing spare latch placement quality determination." This patent describes a method, system, and computer program product for determining the quality of spare latch placement in the floor plan design of an integrated circuit chip. The process involves defining a spare latch placement quality (SLPQ) metric data function, which is then compared to a spare latch placement input through a series of calculations. The SLPQ determination is based on this comparison, leading to the generation of associated reports, both textual and visual. Additionally, the patent outlines an algorithm for constructing a new spare latch placement responsive to the SLPQ determination.

Career Highlights

Eldon Gale Nelson is associated with the International Business Machines Corporation (IBM), where he has contributed to advancements in integrated circuit technology. His work has been instrumental in enhancing the efficiency and effectiveness of circuit designs.

Collaborations

Eldon has collaborated with notable colleagues, including Michael D Amundson and Craig Marshall Darsow. Their combined expertise has fostered innovation and development in their respective projects.

Conclusion

Eldon Gale Nelson's contributions to integrated circuit design through his patent on spare latch placement quality determination exemplify his innovative spirit and dedication to advancing technology. His work continues to influence the field and inspire future developments.

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