Company Filing History:
Years Active: 2013
Title: The Innovative Contributions of Ekmini A DeSilva
Introduction
Ekmini A DeSilva is a notable inventor based in Ossining, NY (US). He has made significant contributions to the field of molecular photoresist materials. His work focuses on the development of advanced materials that have applications in various technological processes.
Latest Patents
Ekmini A DeSilva holds 1 patent for his invention titled "Fluoroalcohol containing molecular photoresist materials and processes of use." This patent describes phenolic molecular glasses, such as calixarenes, which include at least one fluoroalcohol containing unit. The fluoroalcohol containing molecular glasses can be utilized in photoresist compositions. Additionally, the patent discloses processes for generating a resist image on a substrate using the photoresist composition.
Career Highlights
Ekmini A DeSilva is currently employed at International Business Machines Corporation, commonly known as IBM. His role at IBM allows him to engage in cutting-edge research and development, contributing to the advancement of technology in the industry.
Collaborations
Throughout his career, Ekmini has collaborated with several talented individuals, including Luisa Dominica Bozano and Gregory Breyta. These collaborations have fostered innovation and have led to the successful development of new technologies.
Conclusion
Ekmini A DeSilva's work in molecular photoresist materials exemplifies the spirit of innovation in the field of technology. His contributions continue to influence advancements in various applications, showcasing the importance of research and development in driving progress.