Rheinfelden, Germany

Ekkehard Müh

This inventor holds 1 USPTO granted patent and 5 published patent applications and 16 EPO patents. Top assignee: Degussa Aktiengesellschaft. Active years: 2009.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ekkehard Müh. Retrieved from https://idiyas.com/inventor/ekkehard-müh

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

 

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 8(Granted Patents)


Company Filing History:


Years Active: 2009

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1 patent (USPTO):Explore Patents

Title: Ekkehard Müh: Innovator in Organosilane Esters

Introduction

Ekkehard Müh is a notable inventor based in Rheinfelden, Germany. He has made significant contributions to the field of organosilane chemistry, particularly through his innovative processes and compositions.

Latest Patents

Müh holds a patent for the "Preparation of organosilane esters." This invention relates to a specific process for preparing organosilane esters of the formula (I). The composition he developed comprises more than 98% by weight of these organosilane esters and less than 2.0% by weight of at least one hydrocarbon. This composition is utilized as a precursor for producing a layer or film with a dielectric constant of 1 ≤ κ ≤ 4.

Career Highlights

Throughout his career, Ekkehard Müh has worked with prominent companies in the chemical industry. He has been associated with Degussa Aktiengesellschaft and Evonik Degussa GmbH, where he contributed to various innovative projects and advancements in organosilane technology.

Collaborations

Müh has collaborated with several professionals in his field, including Hartwig Rauleder and Harald Klein. These collaborations have further enhanced his work and contributions to organosilane esters.

Conclusion

Ekkehard Müh's work in the preparation of organosilane esters showcases his innovative spirit and dedication to advancing chemical processes. His contributions have had a lasting impact on the industry, and his patent reflects his expertise and commitment to innovation.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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