Ekimini Anuja De Silva

Title: Ekimini Anuja De Silva: Innovator in Semiconductor Technology

Introduction

Ekimini Anuja De Silva is a notable inventor based in Slingerlands, NY (US). He has made significant contributions to the field of semiconductor technology, particularly in the area of patterning techniques.

Latest Patents

Ekimini holds a patent for a "Multi-layer hardmask for defect reduction in EUV patterning." This invention relates to methods, apparatus, and systems that utilize a multi-layer hardmask in the context of patterning a semiconductor substrate using extreme ultraviolet photoresist. The multi-layer hardmask consists of an upper layer made from a metal-containing material, such as a metal oxide, a metal nitride, or a metal oxynitride, and a lower layer composed of an inorganic dielectric silicon-containing material. Together, these layers provide excellent etch selectivity and significantly reduce the formation of defects, such as microbridges and line breaks. The patent also covers various embodiments related to the deposition and etching of the multi-layer hardmask.

Career Highlights

Ekimini has worked with prominent companies in the technology sector, including Lam Research Corporation and International Business Machines Corporation (IBM). His experience in these organizations has allowed him to develop and refine his innovative ideas in semiconductor technology.

Collaborations

Throughout his career, Ekimini has collaborated with talented professionals, including Bhaskar Nagabhirava and Phillip Friddle. These collaborations have contributed to the advancement of his work and the successful implementation of his inventions.

Conclusion

Ekimini Anuja De Silva is a distinguished inventor whose work in semiconductor technology has led to innovative solutions for defect reduction in patterning processes. His contributions continue to impact the industry positively.