Nara, Japan

Eizo Isoyama


Average Co-Inventor Count = 3.7

ph-index = 5

Forward Citations = 70(Granted Patents)


Location History:

  • Sakai, JP (1984 - 1990)
  • Nara, JP (1986 - 2000)

Company Filing History:


Years Active: 1984-2000

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9 patents (USPTO):Explore Patents

Title: Eizo Isoyama: Innovator in Aluminum Electrode Technology

Introduction

Eizo Isoyama is a prominent inventor based in Nara, Japan, known for his significant contributions to the field of aluminum electrode technology. With a total of nine patents to his name, Isoyama has made remarkable advancements that have impacted the manufacturing of electrolytic capacitors.

Latest Patents

Isoyama's latest patents include innovative designs for aluminum electrode foils used in electrolytic capacitors. One of his notable inventions is an aluminum electrode foil that features a sponge-like etching layer on at least one surface. This layer is reduced in thickness, with an aluminum density ranging from 0.8 to 2.2 g/cm³. Another significant patent involves a raw aluminum foil designed for preparing electrolytic condenser electrodes, which boasts an aluminum purity of 99.9% or higher and contains 50-500 ppm of magnesium. The method of etching this raw foil includes a primary etching step in an aqueous bath with specific concentrations of hydrochloric and sulfuric acids, followed by a secondary etching process.

Career Highlights

Throughout his career, Eizo Isoyama has worked with notable companies such as Showa Aluminum Corporation and Showa Aluminum Kabushiki. His work has been instrumental in advancing the technology behind aluminum foils used in various electronic applications.

Collaborations

Isoyama has collaborated with esteemed colleagues, including Tadao Fujihira and Yutaka Kato, contributing to the development of innovative solutions in the field of aluminum electrodes.

Conclusion

Eizo Isoyama's contributions to aluminum electrode technology have established him as a key figure in the industry. His patents reflect a commitment to innovation and excellence in engineering.

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