Utsunomiya, Japan

Eizi Hayakawa

This inventor holds 1 USPTO granted patent. Top assignees: Dainippon Ink and Chemicals, Incorporated, Kawamura Institute of Chemical Research. Active years: 1984.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Eizi Hayakawa. Retrieved from https://idiyas.com/inventor/eizi-hayakawa

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 8(Granted Patents)


Company Filing History:


Years Active: 1984

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1 patent (USPTO):Explore Patents

Title: Eizi Hayakawa: Innovator in Dry Lithographic Printing

Introduction

Eizi Hayakawa is a notable inventor based in Utsunomiya, Japan. He has made significant contributions to the field of dry lithographic printing, showcasing his innovative spirit through his patented inventions.

Latest Patents

Hayakawa holds a patent for a master plate for dry lithographic printing. This invention includes a substrate and an ink-repellent silicone layer. The improvement involves a toner anchoring layer composed of a resin that is compatible with an image layer to be superimposed on the silicone layer during image making. The silicone layer is made of a silicone resin containing a fluorine-containing surface-active compound.

Career Highlights

Throughout his career, Eizi Hayakawa has worked with prominent companies such as Dainippon Ink and Chemicals, Incorporated and Kawamura Institute of Chemical Research. His experience in these organizations has contributed to his expertise in the field of printing technology.

Collaborations

Hayakawa has collaborated with notable individuals in his field, including Akio Kojima and Yoshi Arai. These partnerships have likely enriched his work and led to further advancements in his inventions.

Conclusion

Eizi Hayakawa's contributions to dry lithographic printing through his innovative patent demonstrate his commitment to advancing technology in this area. His work continues to influence the industry and inspire future innovations.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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