This inventor holds 5 USPTO granted patents. Top assignees: Japan Synthetic Rubber Co., Ltd., Toyoda Gosei Co., Ltd.. Active years: 1979-1988.
Location History:
- Komono, JP (1986)
- Mie, JP (1979 - 1988)
Company Filing History:
Years Active: 1979-1988
Title: Eitaro Okuya: Innovator in Polymer Chemistry
Introduction
Eitaro Okuya is a prominent inventor based in Mie, Japan, known for his significant contributions to the field of polymer chemistry. With a total of 5 patents to his name, Okuya has developed innovative materials that have practical applications in various industries.
Latest Patents
Among his latest patents is the invention of an amino group-containing diene copolymer. This copolymer is composed of butadiene, isoprene, acrylonitrile, and a specific (meth)acrylate. It is designed to be used as oil-resistant rubber, demonstrating exceptional resistance to crack growth caused by solvents. Another notable patent involves the production of polymer particles through an aqueous dispersion process. These particles consist of syndiotactic 1,2-polybutadiene and are characterized by their small average diameter of 10 micrometers or less. This innovative process utilizes a unique catalyst system to achieve the desired polymer characteristics.
Career Highlights
Eitaro Okuya has worked with several reputable companies throughout his career, including Japan Synthetic Rubber Co., Ltd. and Toyoda Gosei Co., Ltd. His work in these organizations has allowed him to refine his expertise in polymer development and contribute to advancements in the field.
Collaborations
Throughout his career, Okuya has collaborated with notable colleagues such as Hisao Ono and Hiroji Enyo. These partnerships have fostered a collaborative environment that has led to innovative breakthroughs in polymer chemistry.
Conclusion
Eitaro Okuya's contributions to polymer chemistry through his patents and collaborations highlight his role as an influential inventor in the industry. His work continues to impact the development of advanced materials that meet the demands of modern applications.

