Kanagawa, Japan

Eisuke Fujiwara

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Mitsubishi Chemical Corporation. Active years: 2001.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Eisuke Fujiwara. Retrieved from https://idiyas.com/inventor/eisuke-fujiwara

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 116(Granted Patents)


Company Filing History:


Years Active: 2001

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1 patent (USPTO):Explore Patents

Title: Eisuke Fujiwara: Innovator in Organic Electroluminescent Devices

Introduction

Eisuke Fujiwara is a notable inventor based in Kanagawa, Japan. He has made significant contributions to the field of organic electroluminescent devices. His innovative work has led to the development of a unique patent that showcases his expertise and creativity.

Latest Patents

Eisuke Fujiwara holds a patent for an "Organic electroluminescent device comprising a patterned photosensitive composition and a method for producing same." This invention highlights his ability to merge technology with practical applications, paving the way for advancements in display technologies.

Career Highlights

Fujiwara is currently employed at Mitsubishi Chemical Corporation, where he continues to push the boundaries of innovation. His work at this esteemed company has allowed him to collaborate with other talented professionals in the field.

Collaborations

Some of his notable coworkers include Yoshiharu Sato and Mitsuru Tanamura. Their collective efforts contribute to the ongoing advancements in organic electronics and related technologies.

Conclusion

Eisuke Fujiwara's contributions to the field of organic electroluminescent devices exemplify the spirit of innovation. His patent and work at Mitsubishi Chemical Corporation reflect his dedication to advancing technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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