Kawasaki, Japan

Eishirou Kawana

This inventor holds 2 USPTO granted patents. Top assignee: Fujitsu Corporation. Active years: 1996-1997.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Eishirou Kawana. Retrieved from https://idiyas.com/inventor/eishirou-kawana

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 1.6

ph-index = 1

Forward Citations = 13(Granted Patents)


Company Filing History:


Years Active: 1996-1997

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2 patents (USPTO):Explore Patents

Title: Eishirou Kawana: Innovator in Buffing Apparatus Technology

Introduction

Eishirou Kawana is a notable inventor based in Kawasaki, Japan. He has made significant contributions to the field of buffing apparatus technology. With a total of 2 patents to his name, Kawana's work focuses on enhancing the efficiency and effectiveness of buffing processes.

Latest Patents

Kawana's latest patents include a buffing apparatus designed to buff thin plate work without causing buckling. This innovative apparatus comprises a plurality of buffing rolls that are removably secured in a predetermined spaced relationship to a shaft that is driven to rotate. Additionally, it features a backup roll that is disposed in parallel to the buffing rolls, extending over the overall length of all the buffing rolls. A holding roll is also included, positioned between each adjacent buffing roll, ensuring that the axis aligns with the centers of the buffing and backup rolls, while its outer periphery contacts the buffing rolls' contacting plane.

Career Highlights

Kawana is currently employed at Fujitsu Corporation, where he continues to develop and refine his inventions. His work has been instrumental in advancing the technology used in buffing processes, making them more efficient and reliable.

Collaborations

Throughout his career, Kawana has collaborated with notable colleagues such as Hitoshi Ogawa and Koichi Ishida. These collaborations have contributed to the successful development of his innovative technologies.

Conclusion

Eishirou Kawana's contributions to buffing apparatus technology demonstrate his commitment to innovation and excellence in engineering. His patents reflect a deep understanding of the challenges in buffing processes and provide effective solutions to enhance performance.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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