This inventor holds 1 USPTO granted patent. Top assignee: Kabushiki Kaisha Toyota Chuo Kenkyusho. Active years: 2019.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2019
Title: Eiko Ishii and Semiconductor Etching Innovation.
Introduction
Eiko Ishii is an inventor associated with Nagakute, Japan, and Kabushiki Kaisha Toyota Chuo Kenkyusho. The supplied information identifies her as a woman and credits her with 1 patent.
Latest Patents
Ishii’s listed patent, “Etching Apparatus Used for Photo Electrochemical Etching of Semiconductor Substrate,” describes equipment for photoelectrochemical etching. The apparatus includes a liquid bath containing etching liquid, a support that holds a semiconductor substrate vertically with its treatment surface immersed, and electrodes electrically connected to the substrate and immersed in the liquid. A light source illuminates the treatment surface through an irradiation window positioned horizontally apart from the substrate.
Career Highlights
The available information highlights Ishii’s work on semiconductor-processing equipment and her association with Kabushiki Kaisha Toyota Chuo Kenkyusho. Her listed invention addresses the arrangement of the substrate, electrodes, light source, and irradiation window in an etching apparatus.
Collaborations
The supplied information names Yumi Saito and Teruhisa Akashi as Ishii’s coworkers. It does not specify their roles in the patent or describe particular collaborative projects.
Conclusion
Eiko Ishii’s listed patent focuses on an apparatus for photoelectrochemical semiconductor etching, reflecting her documented contribution to semiconductor-processing technology.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile