Kanagawa-ken, Japan

Eijiro Koike


 

Average Co-Inventor Count = 1.7

ph-index = 1

Forward Citations = 13(Granted Patents)


Location History:

  • Tokyo, JP (2000 - 2001)
  • Machida, JP (2003)
  • Yokohama, JP (2011)
  • Kanagawa-ken, JP (2016)

Company Filing History:


Years Active: 2000-2016

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5 patents (USPTO):Explore Patents

Title: Eijiro Koike: Innovator in Substrate Processing Technology

Introduction

Eijiro Koike is a prominent inventor based in Kanagawa-ken, Japan. He has made significant contributions to the field of substrate processing, holding a total of 5 patents. His work focuses on enhancing the efficiency and effectiveness of substrate processing systems.

Latest Patents

One of Koike's latest patents is a substrate processing system and substrate processing program. This system includes a measuring unit, a data processing unit, and a processing unit. The measuring unit is designed to measure information related to the thickness dimension of a substrate, which incorporates a light-emitting unit and a wavelength conversion unit containing a phosphor. The data processing unit determines processing information based on the measured thickness and the characteristics of light emitted from the light-emitting unit. The processing unit then performs processing of the wavelength conversion unit based on this information.

Another notable patent is for a diffraction optical element, along with a molding die for the optical element and its manufacturing method. This optical element aims to reduce harmful light and minimize deterioration in optical characteristics. It is formed with multiple diffraction gratings, selected based on specific groove apex angles. The design includes chamfer surfaces that enhance the optical performance of the element.

Career Highlights

Eijiro Koike is associated with Kabushiki Kaisha Toshiba, a leading company in technology and innovation. His work at Toshiba has allowed him to develop cutting-edge technologies that have a significant impact on the industry.

Collaborations

Koike has collaborated with notable coworkers, including Masahiro Uekita and Yasutada Nakagawa. Their combined expertise has contributed to the advancement of substrate processing technologies.

Conclusion

Eijiro Koike's innovative work in substrate processing technology has led to several important patents that enhance the efficiency of optical elements and processing systems. His contributions continue to influence the field and demonstrate the importance of innovation in technology.

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