Yasu, Japan

Eiji Tai

This inventor holds 2 USPTO granted patents. Top assignee: Murata Manufacturing Co., Ltd.. Active years: 2004.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Eiji Tai. Retrieved from https://idiyas.com/inventor/eiji-tai

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 50.0

Average Co-Inventor Count = 3.4

ph-index = 1


Company Filing History:


Years Active: 2004

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2 patents (USPTO):Explore Patents

Title: Eiji Tai: Innovator in Semiconductor Technology

Introduction

Eiji Tai is a prominent inventor based in Yasu-gun, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 2 patents. His work focuses on innovative methods for forming electrodes and field effect transistors.

Latest Patents

Eiji Tai's latest patents include an electrode forming method and a field effect transistor. The electrode forming method involves creating a gate electrode through a series of precise steps. A first resist layer with a first opening is applied to a semiconductor substrate, followed by a second resist layer with a larger opening. A first conductor layer made of a high-melting-point metal is then formed, succeeded by a second conductor layer of low-resistance metal. The first conductor layer is etched away within the second opening, and the resist layers are subsequently removed through a lift-off process and ashing.

His second patent focuses on a fine electrode-forming masking member designed to create fine gate electrodes, which can reduce the gate length of a field effect transistor. This method includes forming a first masking member with penetrating portions that align with the fine gate electrodes on a semiconductor substrate using a photosensitive resin. The first masking member is heated to allow parts in contact with the substrate to flow, forming extension portions that decrease the widths of the penetrating portions. Gate electrodes are then formed on the exposed regions of the semiconductor substrate.

Career Highlights

Eiji Tai is currently employed at Murata Manufacturing Co., Ltd., where he continues to advance semiconductor technology. His innovative approaches have positioned him as a key figure in the industry.

Collaborations

Eiji has collaborated with notable coworkers, including Makoto Inai and Hiroyuki Seto. Their combined expertise contributes to the success of their projects and innovations.

Conclusion

Eiji Tai's contributions to semiconductor technology through his patents and work at Murata Manufacturing Co., Ltd. highlight his role as an influential inventor in the field. His innovative methods for electrode formation and field effect transistors pave the way for advancements in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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