Company Filing History:
Years Active: 1998-2001
Title: Eiji Taguchi: Innovator in Thin Film Transistor Technology
Introduction
Eiji Taguchi is a prominent inventor based in Hashima, Japan. He has made significant contributions to the field of semiconductor technology, particularly in the development of thin film transistors. With a total of 2 patents, his work has had a notable impact on display devices.
Latest Patents
Eiji Taguchi's latest patents include innovative methods for manufacturing polycrystalline silicon films. One of his patents focuses on thin film transistors for display devices that utilize two polysilicon active layers of different thicknesses. This method involves forming a first polycrystalline silicon film on a transparent insulation substrate, oxidizing its surface, and then creating an amorphous silicon film on top. The amorphous silicon film undergoes a solid phase growth process to become a second polycrystalline silicon film. The field effect mobility of this second film can be adjusted by controlling the thicknesses of the first and second films. Another patent details a semiconductor device for display devices using thin film transistors, emphasizing the same innovative manufacturing process.
Career Highlights
Eiji Taguchi is associated with Sanyo Electric Co., Ltd., where he has been instrumental in advancing semiconductor technologies. His expertise in thin film transistors has positioned him as a key figure in the industry.
Collaborations
Throughout his career, Eiji Taguchi has collaborated with notable colleagues, including Hiroki Hamada and Kiichi Hirano. Their combined efforts have contributed to the success of various projects in the field of semiconductor technology.
Conclusion
Eiji Taguchi's contributions to the development of thin film transistors have established him as a significant inventor in the semiconductor industry. His innovative patents continue to influence the design and manufacturing of display devices.