Hiratsuka, Japan

Eiji Sunaka

This inventor holds 1 USPTO granted patent. Top assignee: Komatsu Corporation. Active years: 2006.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Eiji Sunaka. Retrieved from https://idiyas.com/inventor/eiji-sunaka

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2006

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1 patent (USPTO):Explore Patents

Title: Eiji Sunaka: Innovator in Excimer Laser Technology

Introduction

Eiji Sunaka is a notable inventor based in Hiratsuka, Japan. He has made significant contributions to the field of excimer laser technology. His innovative work has led to the development of a unique patent that enhances the performance of excimer lasers.

Latest Patents

Eiji Sunaka holds a patent for an excimer laser device and gas for excimer laser. This invention focuses on improving burst and spike characteristics in an excimer laser output during burst operation. The technology involves adding xenon gas from a compact Xe gas cylinder to the gases supplied from an Ar/Ne gas cylinder and an Ar/F2/Ne gas cylinder. The ratio of the xenon gas is detected by an Xe gas sensor, and the supply of xenon gas is controlled by a gas controller.

Career Highlights

Eiji Sunaka is currently employed at Komatsu Corporation, where he continues to work on advancements in laser technology. His expertise and innovative mindset have positioned him as a valuable asset to the company.

Collaborations

Eiji has collaborated with notable coworkers, including Katsutomo Terashima and Akira Sumitani. Their combined efforts contribute to the ongoing development of cutting-edge technologies in their field.

Conclusion

Eiji Sunaka's contributions to excimer laser technology exemplify the spirit of innovation. His patent reflects a significant advancement in the efficiency of laser devices. His work continues to influence the industry and inspire future developments.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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