Osaka, Japan

Eiji Ohta

This inventor holds 2 USPTO granted patents. Top assignees: Osaka Sanso Kogyo Kabushiki-Kaisha, Osaka Sanso Kogyo Ltd.. Active years: 1994-1995.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Eiji Ohta. Retrieved from https://idiyas.com/inventor/eiji-ohta-ur5p5afu

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 5.5

ph-index = 2

Forward Citations = 18(Granted Patents)


Location History:

  • Osaka, JP (1994)
  • Amagasaki, JP (1995)

Company Filing History:


Years Active: 1994-1995

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2 patents (USPTO):Explore Patents

Title: Eiji Ohta: Innovator in Metal Treatment Technologies

Introduction

Eiji Ohta is a notable inventor based in Osaka, Japan. He has made significant contributions to the field of metal treatment technologies, holding two patents that showcase his innovative spirit and technical expertise.

Latest Patents

Ohta's latest patents include a "Process for Forming Passivated Film" and a "Metal Tube Oxidation Treatment Apparatus." These inventions reflect his commitment to advancing metal treatment processes and improving industrial applications.

Career Highlights

Throughout his career, Eiji Ohta has worked with prominent companies such as Osaka Sanso Kogyo Ltd. and Osaka Sanso Kogyo Kabushiki-kaisha. His experience in these organizations has allowed him to develop and refine his innovative ideas in metal treatment.

Collaborations

Ohta has collaborated with talented individuals in his field, including Yoshiyuki Nakahara and Takashi Sakanaka. These partnerships have contributed to the development of his patents and the advancement of technology in metal treatment.

Conclusion

Eiji Ohta's contributions to metal treatment technologies through his patents and collaborations highlight his role as an influential inventor. His work continues to impact the industry and inspire future innovations.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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