Company Filing History:
Years Active: 1999-2000
Title: Eiji Kitaoka: Innovator in Silicon Carbide Technology
Introduction
Eiji Kitaoka is a prominent inventor based in Anjo, Japan. He has made significant contributions to the field of semiconductor technology, particularly in the production of silicon carbide materials. With a total of 2 patents, his work has advanced the capabilities of semiconductor substrates.
Latest Patents
Kitaoka's latest patents include a method of producing single-crystal silicon carbide and a semiconductor substrate designed to straighten warp in SiC substrates. The first patent describes a process where a (111) cubic silicon carbide single-crystal layer is formed on a (111) silicon wafer, which is then removed. This layer serves as a seed crystal in a graphite crucible, where silicon carbide source material is sublimated in an inert gas atmosphere. This innovative method allows for the formation of a high-quality (0001) α-type silicon carbide single-crystal layer at a lower cost. The second patent focuses on a SiC substrate that consists of n-type and p-type epitaxial layers. It involves forming grooves in a grid pattern on the substrate, followed by heat treatment to correct any warping caused by the growth of these layers.
Career Highlights
Kitaoka is currently employed at Denso Corporation, a leading company in the automotive industry. His work at Denso has allowed him to apply his innovative ideas in practical applications, contributing to advancements in semiconductor technology.
Collaborations
Throughout his career, Eiji Kitaoka has collaborated with notable colleagues such as Yasuo Kito and Youichi Kotanshi. These partnerships have fostered a creative environment that encourages the development of groundbreaking technologies.
Conclusion
Eiji Kitaoka's contributions to silicon carbide technology and semiconductor substrates highlight his role as a key innovator in the field. His patents reflect a commitment to advancing technology in a cost-effective manner. His work continues to influence the semiconductor industry and pave the way for future innovations.