Nagoya, Japan

Eiji Ikeda

This inventor holds 1 USPTO granted patent. Top assignee: Aica Kogyo Company, Limited. Active years: 1983.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Eiji Ikeda. Retrieved from https://idiyas.com/inventor/eiji-ikeda-fgxf8z2w

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 31(Granted Patents)


Company Filing History:


Years Active: 1983

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1 patent (USPTO):Explore Patents

Title: Eiji Ikeda: Innovator in Basin-Fitted Tops

Introduction

Eiji Ikeda is a notable inventor based in Nagoya, Japan. He has made significant contributions to the field of product design, particularly with his innovative approach to tops fitted with basins. His work exemplifies the intersection of functionality and aesthetics in everyday products.

Latest Patents

Eiji Ikeda holds a patent for "Tops fitted with basins and process for their production." This invention showcases his ability to enhance the utility of clothing by integrating practical features that cater to modern needs. He has 1 patent to his name, reflecting his commitment to innovation.

Career Highlights

Ikeda is associated with Aica Kogyo Company, Limited, a company known for its advancements in materials and product design. His role there has allowed him to explore and develop new ideas that push the boundaries of conventional design.

Collaborations

Throughout his career, Eiji Ikeda has worked alongside talented individuals such as Tomohiro Adachi and Yoshihiro Ito. These collaborations have fostered a creative environment that encourages the exchange of ideas and innovative solutions.

Conclusion

Eiji Ikeda's contributions to the field of design, particularly through his patented invention, highlight his role as a forward-thinking inventor. His work continues to inspire innovation in product development, making everyday items more functional and appealing.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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