This inventor holds 1 USPTO granted patent. Top assignee: Nec Corporation. Active years: 1998.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1998
Title: Eiji Ikawa: Innovator in Semiconductor Manufacturing
Introduction
Eiji Ikawa is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of semiconductor manufacturing. His innovative methods have paved the way for advancements in technology.
Latest Patents
Eiji Ikawa holds a patent for a method for selectively etching a polycide layer. This patent describes a process for manufacturing a semiconductor device that includes anisotropic-etching of a high-melting-point metal silicide layer. The method utilizes a halogen-containing gas, primarily boron trichloride, along with either chlorine gas or hydrogen bromide as auxiliary components.
Career Highlights
Eiji Ikawa is associated with NEC Corporation, a leading company in the technology sector. His work has been instrumental in enhancing semiconductor device manufacturing processes. His expertise in this area has garnered recognition within the industry.
Collaborations
Throughout his career, Eiji Ikawa has collaborated with notable colleagues, including Kazuyoshi Yoshida and Hidenobu Miyamoto. These partnerships have contributed to the development of innovative solutions in semiconductor technology.
Conclusion
Eiji Ikawa's contributions to semiconductor manufacturing through his patented methods highlight his role as an influential inventor. His work continues to impact the technology landscape significantly.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile