Okayama, Japan

Eiichi Yorita

This inventor holds 4 USPTO granted patents. Top assignee: Shinagawa Refractories Co., Ltd.. Active years: 1981-1992.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Eiichi Yorita. Retrieved from https://idiyas.com/inventor/eiichi-yorita

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.7

ph-index = 3

Forward Citations = 50(Granted Patents)


Location History:

  • Taiyo, JP (1981)
  • Okayama, JP (1981 - 1992)

Company Filing History:


Years Active: 1981-1992

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4 patents (USPTO):Explore Patents

Title: Eiichi Yorita: Innovator in Refractory Technology

Introduction

Eiichi Yorita is a notable inventor based in Okayama, Japan. He has made significant contributions to the field of refractory technology, holding a total of 4 patents. His work focuses on improving the efficiency and effectiveness of materials used in high-temperature environments.

Latest Patents

Yorita's latest patents include an "Apparatus for observing the interior of a hot furnace" and a "Method for gunning a refractory composition." These innovations demonstrate his commitment to advancing technology in the refractory industry.

Career Highlights

Eiichi Yorita is currently employed at Shinagawa Refractories Co., Ltd. His role at the company allows him to apply his inventive skills to real-world challenges in refractory materials. His contributions have been instrumental in enhancing the performance of products used in various industrial applications.

Collaborations

Yorita has collaborated with talented coworkers such as Takashi Yamamura and Hiroyuki Danjyo. Their teamwork has fostered an environment of innovation and creativity, leading to the development of cutting-edge solutions in the refractory sector.

Conclusion

Eiichi Yorita's work exemplifies the spirit of innovation in the field of refractory technology. His patents and collaborations highlight his dedication to improving industrial processes and materials.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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