Tokyo, Japan

Eiichi Yamaguchi

This inventor holds 2 USPTO granted patents and 1 published patent application. Top assignees: Arczone K.K., Powdec K.k.. Active years: 2008-2026.

USPTO Granted Patents = 2 

% Patents Active = 50.0

Average Co-Inventor Count = 1.3

ph-index = 1

Forward Citations = 7(Granted Patents)


Company Filing History:


Years Active: 2008-2026

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2 patents (USPTO):Explore Patents

Title: Eiichi Yamaguchi: Innovator in Chemical Vapor Deposition

Introduction

Eiichi Yamaguchi is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of chemical vapor deposition and has been awarded 2 patents for his innovative work. His inventions reflect a deep understanding of materials science and engineering.

Latest Patents

Yamaguchi's latest patents include a metal-carbohydrate complex and a chemical vapor deposition apparatus. The metal-carbohydrate complex features an L-glucose derivative represented by a specific general formula. The chemical vapor deposition apparatus is designed to enhance the growth of III-V compound semiconductors, such as GaN. It includes a susceptor support base and a susceptor, which is configured to rotate with a rotary shaft. A gap of about 1 mm or more is provided along the boundary between the support base and the perimeter of the susceptor to prevent gallium from forming bridges during the growth process, thereby ensuring smooth rotation.

Career Highlights

Throughout his career, Yamaguchi has worked with various companies, including Arczone K.K. and Powdec K.K. His expertise in chemical processes and materials has made him a valuable asset in these organizations.

Collaborations

Yamaguchi has collaborated with notable figures in his field, including Hideki Iijima. Their joint efforts have contributed to advancements in semiconductor technology.

Conclusion

Eiichi Yamaguchi's innovative work in chemical vapor deposition and his contributions to materials science have established him as a prominent inventor. His patents and collaborations reflect his commitment to advancing technology in this critical area.

Profile summary based on public USPTO records.
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