Eiichi Ono

Title: Eiichi Ono: Innovator in Floor Polishing and Silica Composites

Introduction

Eiichi Ono is a notable inventor based in Kitakyushu, Japan. He has made significant contributions to the field of materials science, particularly in the development of floor polishing compositions and silica-metal oxide composites. With a total of 2 patents, Ono's work reflects his innovative approach to solving practical problems in industrial applications.

Latest Patents

Ono's latest patents include a floor polishing composition that features a film-formable organic high molecular material as its main component. This composition is enhanced with scaly particles, which improve its effectiveness. Another significant patent is for a silica-metal oxide particulate composite, which comprises silica agglomerates with voids formed by the random stacking of scaly silica primary particles. This composite also includes metal oxide particulates that are supported on the surfaces and inner surfaces of the voids within the silica agglomerates.

Career Highlights

Throughout his career, Eiichi Ono has worked with prominent companies such as Asahi Glass Company, Limited and Dohkai Chemical Industry Co., Ltd. His experience in these organizations has allowed him to refine his expertise and contribute to various innovative projects.

Collaborations

Ono has collaborated with several talented individuals in his field, including Kunihiko Terase and Masaki Inoue. These partnerships have fostered a creative environment that has led to the development of groundbreaking technologies.

Conclusion

Eiichi Ono's contributions to the fields of floor polishing and silica composites demonstrate his commitment to innovation and excellence. His patents reflect a deep understanding of material properties and their applications in industry.