Yokohama, Japan

Eiichi Noda


Average Co-Inventor Count = 3.5

ph-index = 2

Forward Citations = 15(Granted Patents)


Location History:

  • Yokohama, JP (1980 - 1985)
  • Fujisawa, JP (1985)

Company Filing History:


Years Active: 1980-1985

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3 patents (USPTO):Explore Patents

Title: Eiichi Noda: Innovator in Chemical Engineering

Introduction

Eiichi Noda is a prominent inventor based in Yokohama, Japan. He has made significant contributions to the field of chemical engineering, particularly in the development of innovative compositions and processes. With a total of 3 patents to his name, Noda's work has had a notable impact on various applications.

Latest Patents

Noda's latest patents include a composition suitable for use in the production of laser beams. This composition is obtained by incorporating a benzenedithiol nickel complex in a liquid formulation that contains a solvent and an organic polymer as a binder. It is designed to produce a laser beam recording and reading means with an absorption band in the region of 800-950 nm. Another significant patent is for a process for producing 2-mercaptoethylamine hydrohalides. This process involves reacting a 2-mercaptothiazoline with a 2-halogenoethylamine hydrohalide in the presence of water, resulting in a compound that has various potential applications.

Career Highlights

Eiichi Noda is currently associated with Mitsui Toatsu Chemicals, Incorporated, where he continues to innovate and contribute to the field. His work has been recognized for its practical applications and advancements in chemical formulations.

Collaborations

Noda has collaborated with notable coworkers, including Yoshiaki Noguchi and Isamu Yamamoto. Their combined expertise has fostered a productive environment for innovation and development.

Conclusion

Eiichi Noda's contributions to chemical engineering through his patents and collaborations highlight his role as a key innovator in the industry. His work continues to influence advancements in technology and applications in various fields.

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