Ishikawa, Japan

Eiichi Nagumo

This inventor holds 1 USPTO granted patent and 2 published patent applications. Top assignee: Kabushiki Kaisha Toshiba. Active years: 2019.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Eiichi Nagumo. Retrieved from https://idiyas.com/inventor/eiichi-nagumo

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 38(Granted Patents)


Company Filing History:


Years Active: 2019

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1 patent (USPTO):Explore Patents

Title: The Innovations of Eiichi Nagumo

Introduction

Eiichi Nagumo is a notable inventor based in Ishikawa, Japan. He has made significant contributions to the field of semiconductor manufacturing. His work has led to the development of innovative technologies that enhance the efficiency and effectiveness of semiconductor production.

Latest Patents

Nagumo holds a patent for an electrostatic chuck and semiconductor manufacturing apparatus. This invention includes a first electrode provided in a first plane and a second electrode in a parallel second plane. The design features an insulator placed between the two electrodes. The second electrode consists of multiple portions that intersect with an intersection line between the region where the first electrode is orthogonally projected onto the second plane and a third plane that is vertical to the second plane. This innovative design aims to improve the performance of semiconductor manufacturing processes.

Career Highlights

Eiichi Nagumo is associated with Kabushiki Kaisha Toshiba, a leading company in technology and electronics. His work at Toshiba has allowed him to focus on advancements in semiconductor technology. With a patent portfolio that includes 1 patent, he has established himself as a key figure in his field.

Collaborations

Nagumo has worked alongside talented colleagues such as Makoto Saito and Shinya Ito. Their collaborative efforts have contributed to the success of various projects within the company.

Conclusion

Eiichi Nagumo's contributions to semiconductor manufacturing through his innovative patent demonstrate his expertise and commitment to advancing technology. His work continues to influence the industry and pave the way for future innovations.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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