Amagasaki, Japan

Eichi Okamoto

This inventor holds 1 USPTO granted patent. Top assignee: Mitsubishi Denki Kabushiki Kaisha. Active years: 1976.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Eichi Okamoto. Retrieved from https://idiyas.com/inventor/eichi-okamoto-tl77q2tf

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 13(Granted Patents)


Company Filing History:


Years Active: 1976

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1 patent (USPTO):Explore Patents

Title: Eichi Okamoto: Innovator in Holographic Storage Technology

Introduction

Eichi Okamoto is a notable inventor based in Amagasaki, Japan. He has made significant contributions to the field of holographic storage materials. His innovative work has the potential to revolutionize data storage technologies.

Latest Patents

Eichi Okamoto holds a patent for a holographic storage material. This patent involves the use of lithium niobate in the form of a single crystal, enhanced with either from 0.001 to 3.0 molar percent of iridium or from 0.01 to 1.0 molar percent of uranium for three-dimensional holography. This advancement could lead to more efficient and compact data storage solutions.

Career Highlights

Okamoto is associated with Mitsubishi Electric Corporation, where he has been instrumental in developing cutting-edge technologies. His work in holography has garnered attention for its innovative approach to data storage.

Collaborations

Eichi Okamoto has collaborated with notable colleagues, including Hirofumi Ikeo and Shoichi Noda. These partnerships have contributed to the advancement of holographic technologies.

Conclusion

Eichi Okamoto's contributions to holographic storage materials highlight his role as a key innovator in the field. His work continues to inspire advancements in data storage technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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