Tel Aviv, Israel

Ehud Banin

This inventor holds 4 USPTO granted patents and 1 published patent application. Top assignees: Bar-Ilan University, Ben-Gurion University of the Negev Research and Development Authority. Active years: 2015-2020.

USPTO Granted Patents = 4 

% Patents Active = 75.0

Average Co-Inventor Count = 4.4

ph-index = 2

Forward Citations = 7(Granted Patents)


Company Filing History:


Years Active: 2015-2020

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4 patents (USPTO):Explore Patents

Title: Ehud Banin: Innovator in Nanoparticle Technology

Introduction

Ehud Banin is a prominent inventor based in Tel Aviv, Israel. He has made significant contributions to the field of nanoparticle technology, holding a total of 4 patents. His work focuses on the development and application of advanced materials that have the potential to revolutionize various industries.

Latest Patents

Banin's latest patents include innovative technologies such as polyamide nanoparticles and their uses. These nanoparticles are designed to reduce the formation of organic-based contaminants, including microorganisms and biofilms. His work on doped metal oxide nanoparticles also showcases his expertise, as these composites are aimed at enhancing the effectiveness of materials in various applications.

Career Highlights

Throughout his career, Banin has been associated with esteemed institutions such as Bar-Ilan University and Ben-Gurion University of the Negev Research and Development Authority. His research has not only advanced scientific knowledge but has also paved the way for practical applications in environmental and health-related fields.

Collaborations

Banin has collaborated with notable colleagues, including Shlomo Margel and Ori Gutman. These partnerships have fostered a rich exchange of ideas and have contributed to the success of his research endeavors.

Conclusion

Ehud Banin's innovative work in nanoparticle technology exemplifies the impact of scientific research on real-world applications. His contributions continue to influence the field and inspire future advancements.

Profile summary based on public USPTO records.
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