Munich, Germany

Edwin Wahl

This inventor holds 2 USPTO granted patents. Top assignee: Marker International Company. Active years: 1985-1986.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Edwin Wahl. Retrieved from https://idiyas.com/inventor/edwin-wahl

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 1985-1986

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2 patents (USPTO):Explore Patents

Title: Edwin Wahl: Innovator in Ski Binding Technology

Introduction

Edwin Wahl is a notable inventor based in Munich, Germany. He has made significant contributions to the field of ski binding technology. With a total of 2 patents to his name, Wahl has demonstrated his expertise and creativity in this specialized area.

Latest Patents

Wahl's latest patents include a heel element for ski binding and a ski toe clamp. These innovations reflect his commitment to enhancing the safety and performance of skiing equipment. His work is crucial for both recreational and professional skiers.

Career Highlights

Wahl is currently employed at Marker International Company, a leading manufacturer in the ski industry. His role at the company allows him to apply his inventive skills to develop cutting-edge ski binding solutions. His contributions have helped shape the standards of ski safety and performance.

Collaborations

Wahl has collaborated with Herbert H. Schultes, a fellow innovator in the field. Their partnership has fostered the development of advanced technologies in ski bindings, further enhancing the skiing experience for users.

Conclusion

Edwin Wahl's contributions to ski binding technology through his patents and collaborations highlight his importance in the field. His work continues to influence the skiing industry, ensuring safety and performance for enthusiasts around the world.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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