This inventor holds 1 USPTO granted patent. Top assignees: International Business Machines Corporation, Siemens Aktiengesellschaft. Active years: 1997.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:


Years Active: 1997
Title: Edward William Kiewra: Innovator in Silicon Etch Processes
Introduction
Edward William Kiewra is a notable inventor based in Kilchberg, Switzerland. He is recognized for his contributions to the field of semiconductor manufacturing, particularly in the development of innovative etching processes. His work has significantly impacted the efficiency and effectiveness of silicon etching techniques.
Latest Patents
Kiewra holds a patent for an isotropic silicon etch process that is highly selective to tungsten. This back end of the line dry etch method involves the etching of a mask oxide and a temporary silicon mandrel after the formation of gate stacks and tungsten studs. The process utilizes a polymerizing oxide etch to selectively etch the mask oxide relative to tungsten and silicon. Additionally, it allows for the selective etching of silicon to silicon nitride, silicon oxide, and tungsten. The method effectively removes the silicon mandrel and associated silicon residual stringers by adjusting the backside helium cooling, using HBr as the single species etchant, and modifying the duration, pressure, and electrode gaps during the silicon etch process. The silicon used may be undoped polysilicon, doped polysilicon, or single crystal silicon.
Career Highlights
Throughout his career, Kiewra has worked with prominent companies in the technology sector. He has been associated with IBM and Siemens Aktiengesellschaft, where he contributed to various projects and advancements in semiconductor technology. His expertise in etching processes has made him a valuable asset in these organizations.
Collaborations
Kiewra has collaborated with notable colleagues, including Elke Eckstein and Marc Jay Weiss. These partnerships have fostered innovation and the exchange of ideas in the field of semiconductor manufacturing.
Conclusion
Edward William Kiewra's contributions to the field of silicon etching processes demonstrate his innovative spirit and technical expertise. His patented isotropic silicon etch process highlights the importance of selectivity in semiconductor manufacturing. Kiewra's work continues to influence the industry and pave the way for future advancements.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile