St. Albans, VT, United States of America

Edward P Lowe, Jr

This inventor holds 1 USPTO granted patent. Top assignee: International Business Machines Corporation. Active years: 2003.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Edward P Lowe, Jr. Retrieved from https://idiyas.com/inventor/edward-p-lowe-jr

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 16(Granted Patents)


Company Filing History:


Years Active: 2003

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1 patent (USPTO):Explore Patents

Title: Edward P. Lowe, Jr.: Innovator in Ion Implantation Technology

Introduction

Edward P. Lowe, Jr. is a notable inventor based in St. Albans, Vermont, known for his contributions to the field of semiconductor technology. He has developed innovative solutions that enhance the efficiency and effectiveness of ion implantation processes. His work has significant implications for the manufacturing of semiconductor devices.

Latest Patents

Edward P. Lowe, Jr. holds a patent for an "Ion implanter in-situ mass spectrometer." This apparatus is designed for the in-situ detection of ions within a beam of an ion implanter device. The mass spectrometer features inner and outer walls and includes a system for generating and directing an ion implant beam through the device. It generates a magnetic field to direct desirable ions through an aperture for implantation into semiconductor wafers while causing undesirable ions to collide with the walls. The device is equipped with detectors to identify and measure the concentration of these undesirable ions, allowing for real-time monitoring and corrective actions during wafer processing.

Career Highlights

Edward P. Lowe, Jr. has made significant strides in his career, particularly through his work at International Business Machines Corporation (IBM). His innovative approach to ion implantation technology has positioned him as a key figure in the semiconductor industry. His patent reflects his commitment to improving the quality and reliability of semiconductor manufacturing processes.

Collaborations

Throughout his career, Edward has collaborated with notable colleagues, including Nicholas Mone, Jr. and Edward D. Adams. These collaborations have contributed to the advancement of technology in the field and have fostered a culture of innovation within their work environment.

Conclusion

Edward P. Lowe, Jr. is a distinguished inventor whose work in ion implantation technology has made a lasting impact on the semiconductor industry. His innovative patent demonstrates his dedication to enhancing manufacturing processes and ensuring the quality of semiconductor devices.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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