East Douglas, MA, United States of America

Edward P Lariviere

This inventor holds 1 USPTO granted patent. Top assignee: Nelmor Company, Inc.. Active years: 1991.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Edward P Lariviere. Retrieved from https://idiyas.com/inventor/edward-p-lariviere

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 1991

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1 patent (USPTO):Explore Patents

Title: Edward P. Lariviere: Innovator in Granulation Technology

Introduction

Edward P. Lariviere is a notable inventor based in East Douglas, MA (US). He has made significant contributions to the field of granulation technology, particularly with his innovative designs that enhance efficiency in manufacturing processes.

Latest Patents

Lariviere holds a patent for a "Bin inlet deflector for a granulator." This invention involves a deflector that is secured to the screen chamber and encloses the bin, ensuring that all granulate is received in the bin and not outside of it. This innovation addresses common issues in granulation processes, improving material handling and reducing waste.

Career Highlights

Edward P. Lariviere is associated with Nelmor Company, Inc., where he applies his expertise in engineering and design. His work at Nelmor has allowed him to focus on developing solutions that meet the needs of the granulation industry.

Collaborations

Throughout his career, Lariviere has collaborated with talented individuals such as Jean B. Lamoureux and Thomas D. McBride. These partnerships have fostered a creative environment that encourages innovation and the development of new technologies.

Conclusion

Edward P. Lariviere's contributions to granulation technology through his patent and work at Nelmor Company, Inc. highlight his role as an important figure in the field. His innovative spirit continues to drive advancements in manufacturing processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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