Location History:
- Milpitas, CA (US) (1999)
- North Stillwater, MN (US) (2000 - 2003)
Company Filing History:
Years Active: 1999-2003
Title: Edward M. Shamble: Innovator in Integrated Circuit Technology
Introduction
Edward M. Shamble is a notable inventor based in North Stillwater, MN (US). He has made significant contributions to the field of integrated circuit technology, holding a total of 3 patents. His work focuses on methods for monitoring defects in the manufacturing processes of integrated circuits.
Latest Patents
Shamble's latest patents include innovative methods for forming contact holes, vias, and trenches in integrated circuits. One of his key patents, titled "Contact monitor, method of forming same and method of analyzing," outlines a process that involves creating a sacrificial topology on a substrate. This process substitutes a material that is substantially free of elemental silicon for any silicon present in the device being monitored. The method includes etching the sacrificial topology, removing portions of it, and inspecting the substrate with a wafer surface inspection tool. The use of a dielectric material allows for easier etching and removal compared to polysilicon, ensuring that properly formed contact holes, vias, and trenches are created in the actual devices.
Career Highlights
Edward M. Shamble has established himself as a key figure in the semiconductor industry. He is currently employed at Cypress Semiconductor Corporation, where he continues to innovate and develop new technologies. His expertise in integrated circuits has made a significant impact on the field.
Collaborations
Shamble has worked alongside talented colleagues, including Thomas Boonstra and David J. Brownell. Their collaborative efforts have contributed to advancements in semiconductor technology.
Conclusion
Edward M. Shamble's contributions to integrated circuit technology through his patents and work at Cypress Semiconductor Corporation highlight his role as an influential inventor in the field. His innovative methods for monitoring defects in manufacturing processes continue to shape the future of semiconductor technology.