Rancho Palos Verdes, CA, United States of America

Edward Koretzky

This inventor holds 1 USPTO granted patent. Top assignee: New York University. Active years: 2001.


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 62(Granted Patents)


Company Filing History:


Years Active: 2001

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1 patent (USPTO):Explore Patents

Title: Edward Koretzky: Innovator in Plasma Technology

Introduction

Edward Koretzky is a notable inventor based in Rancho Palos Verdes, California. He has made significant contributions to the field of plasma technology, particularly through his innovative patent related to plasma torch systems. His work has implications for various applications, including energy efficiency and fuel ignition.

Latest Patents

Koretzky holds a patent titled "Methods and apparatus for generating a plasma torch." This patent describes a modular system for constructing an atmospheric pressure plasma source. The plasma torch module can be assembled using the structural components of two different models of spark plugs. Each module is capable of producing a plasma torch with a radius of about 1 cm or more and a height of approximately 6 cm, achieving a peak density exceeding 10 cm. By connecting multiple modules in series with a ballasting capacitor, an array can be operated using a common power supply to generate a plasma of considerable volume and high density. This system has potential applications in absorbing radiation, reducing air drag, and igniting fuel.

Career Highlights

Edward Koretzky is affiliated with New York University, where he continues to advance his research in plasma technology. His work is characterized by a focus on practical applications that can benefit various industries.

Collaborations

Koretzky has collaborated with notable colleagues, including Lester Orlick and Spencer P Kuo. These partnerships have contributed to the development and refinement of his innovative technologies.

Conclusion

Edward Koretzky's contributions to plasma technology through his patent demonstrate his commitment to innovation and practical applications. His work continues to influence the field and offers promising solutions for future advancements.

Profile summary based on public USPTO records.
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