Oxford, CT, United States of America

Edward J Suttile


Average Co-Inventor Count = 4.2

ph-index = 4

Forward Citations = 39(Granted Patents)


Company Filing History:


Years Active: 2004-2010

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5 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Edward J. Suttile

Introduction

Edward J. Suttile is a notable inventor based in Oxford, CT, who has made significant contributions to the field of photomask manufacturing. With a total of five patents to his name, Suttile has developed innovative systems that enhance the efficiency and accuracy of photomask order processing.

Latest Patents

Suttile's latest patents include a "Rule based system and method for automatically generating photomask orders by conditioning information from a customer's computer system." This invention provides a structured approach to generating photomask orders, ensuring that users enter complete information through a user-friendly graphical interface. Another significant patent is the "Automated manufacturing system and method for processing photomasks." This invention streamlines the manufacturing process by interfacing customer information with the manufacturer's computer system, reducing manual intervention and minimizing errors.

Career Highlights

Edward J. Suttile has dedicated his career to advancing photomask technology. His work at Photronics Corp. has positioned him as a key player in the industry, where he has focused on automating processes to improve efficiency and reduce costs. His innovative solutions have been instrumental in modernizing photomask manufacturing.

Collaborations

Suttile has collaborated with notable colleagues such as Charles E. Croke and James P. Morrison. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and the development of cutting-edge technologies.

Conclusion

Edward J. Suttile's contributions to photomask manufacturing through his innovative patents and collaborative efforts have significantly impacted the industry. His work continues to pave the way for advancements in automation and efficiency in photomask production.

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