The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 20, 2009

Filed:

Jul. 08, 2005
Applicants:

Edward J. Suttile, Oxford, CT (US);

Charles Croke, Waterbury, CT (US);

James P. Morrison, Sandy Hook, CT (US);

Ryan T. Vo, San Jose, CA (US);

Peter F. Jones, New Hartford, CT (US);

Mary R. Spano, Danbury, CT (US);

Edward Arthur Mills, Malabar, FL (US);

Inventors:

Edward J. Suttile, Oxford, CT (US);

Charles Croke, Waterbury, CT (US);

James P. Morrison, Sandy Hook, CT (US);

Ryan T. Vo, San Jose, CA (US);

Peter F. Jones, New Hartford, CT (US);

Mary R. Spano, Danbury, CT (US);

Edward Arthur Mills, Malabar, FL (US);

Assignee:

Photronics, Inc., Brookfield, CT (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 19/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

The present invention relates generally to an automated manufacturing system and method for manufacturing photomasks wherein information provided by a customer at a remote location is interfaced, via a network, to a photomask manufacturer's computer system and automatically processes data for manufacturing a photomask and automatically formats and routes data to processing equipment. The present invention reduces the need for manual intervention, thereby avoiding costly delays and transcription errors associated therewith. The software of the present invention provides for automatic generation of data arrays, which can be used to process and monitor the status of a photomask during manufacture. Further, the software is capable of automatically modifying design data provided by a photomask user. Additionally, the software of the present invention includes an automatic messaging system which can notify users of the system, of status and errors in manufacture of photomasks. The present invention also includes a real time monitoring system capable of notifying users of the status and errors in the processing of the photomask during manufacture.


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