East Hampstead, NH, United States of America

Edward J Ficarra

This inventor holds 1 USPTO granted patent. Top assignee: Onto Innovation Inc.. Active years: 2022.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Edward J Ficarra. Retrieved from https://idiyas.com/inventor/edward-j-ficarra

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2022

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1 patent (USPTO):Explore Patents

Title: Edward J Ficarra: Innovator in Substrate Processing Technology

Introduction

Edward J Ficarra is a notable inventor based in East Hampstead, NH (US). He has made significant contributions to the field of substrate processing technology, particularly in the development of improved stages for handling large, thin substrates such as glass and semiconductor panels.

Latest Patents

Ficarra holds a patent for a device known as the Conformal Stage. This innovative stage enhances the processing of substrates by incorporating features that allow for lithography, inspection, metrology, and grinding. The design includes a chuck that moves over a base, conforming to the geometry of the base while processing the substrate.

Career Highlights

Ficarra's career is marked by his work at Onto Innovation Inc., where he has been instrumental in advancing technologies related to substrate processing. His expertise in this area has led to the development of solutions that improve efficiency and precision in manufacturing processes.

Collaborations

Throughout his career, Ficarra has collaborated with talented individuals such as J Casey Donaher and Christopher J McLaughlin. These partnerships have contributed to the successful development and implementation of innovative technologies in the industry.

Conclusion

Edward J Ficarra's contributions to substrate processing technology exemplify his commitment to innovation and excellence. His work continues to influence the field and pave the way for future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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