Edward J Fehring, Jr

Title: Edward J Fehring, Jr: Innovator in Compound Thin Films

Introduction

Edward J Fehring, Jr. is a notable inventor based in Dublin, CA (US). He has made significant contributions to the field of material science, particularly in the development of low work function, stable compound thin films. With a total of 2 patents, his work has implications for various advanced technologies.

Latest Patents

Fehring's latest patents focus on the generation of low work function, stable compound thin films through laser ablation. These films can be synthesized by simultaneously laser ablating silicon and thermally evaporating an alkali metal in an oxygen environment. For instance, the compound thin film may consist of Si/Cs/O. The work functions of these thin films can be adjusted by altering the silicon/alkali metal/oxygen ratio. The stability of these films has been confirmed through ultraviolet photoelectron spectroscopy (UPS) and they remain stable up to 500°C, as measured by x-ray photoelectron spectroscopy (XPS). Notably, tests have shown that certain chemical compositions and annealing temperatures can lead to the detection of negative electron affinity (NEA). These low work function, stable compound thin films have potential applications in solar cells, field emission flat panel displays, electron guns, and cold cathode electron guns.

Career Highlights

Fehring is affiliated with the University of California, where he continues to advance research in his field. His innovative work has garnered attention and respect within the scientific community.

Collaborations

He has collaborated with notable colleagues such as Long N Dinh and William McLean, II, contributing to the advancement of research in compound thin films.

Conclusion

Edward J Fehring, Jr. is a prominent inventor whose work in low work function, stable compound thin films is paving the way for advancements in various technological applications. His contributions are significant in the realm of material science and innovation.